TETRAMETHYL AMMONIUM HYDROXIDE PENTAHYDRATE FOR SYNTHESIS It is used as a basic solvent in the development of acidic photoresist in the photolithography process, and is highly effective in stripping photoresist. TMAH has some phase transfer catalyst properties, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanoparticle aggregation. Safety data sheet: Sigma-Aldrich MSDS for TM...

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